@InProceedings{PillacaKostUedaSilv:2009:StInSt,
               author = "Pillaca, E. J. D. M. and Kostov, K. G. and Ueda, M{\'a}rio and 
                         Silva J{\'u}nior, A. R.",
          affiliation = "UNESP and UNESP and {Instituto Nacional de Pesquisas Espaciais 
                         (INPE)} and {Instituto Nacional de Pesquisas Espaciais (INPE)}",
                title = "Study of the Influence of a Static Magnetic Field on the Plasma 
                         Immersion Ion Implantation Process",
                 year = "2009",
         organization = "International Workshop on Plasma-Based Ion Implantation and 
                         Deposition, 10. (PPI\&D).",
             abstract = "Plasma immersion ion implantation (PIII) is an established method 
                         for the treatment and surface modification of materials. This 
                         technique is fast and efficient in treating 3D targets, however, 
                         PIII owns some disadvantages. Perfect dose uniformity is usually 
                         difficult to achieve when treating samples of complex shape. The 
                         problem arises from the uncontrolled expansion of plasma sheath. 
                         Several studies have shown that to obtain an uniform implantation 
                         the extension of plasma sheath must be kept always small in 
                         relation to target size. Recent studies have demonstrated that the 
                         sheath expansion as well as secondary electrons dynamics in PIII 
                         are significantly affected by an external magnetic field, 
                         especially in the case when the magnetic field is parallel to the 
                         workpiece surface. in this work, we have analyzed by means of 
                         numerical simulation the effect of external magnetic field on the 
                         PIII process. The magnetic field configuration is similar to that 
                         of magnetic trap and is produced by a set of external coils. The 
                         simulation has been carried out for nitrogen plasma using the 2.5D 
                         computer code KARAT that employs the particle-in-cell (PIC) 
                         algorithm. It is found that a high density plasma region is formed 
                         around the target due to intense background gas ionization by the 
                         magnetized electrons drifting in the crossed ExB field. As a 
                         result, the sheath expansion is suppressed and an increase of 
                         implantation current in comparison to the PIII process without 
                         magnetic field is observed. Later, the validity of numerical 
                         simulation has been investigated experimentally. The plasma 
                         parameters were determined from the characteristic curve of a 
                         double Langmuir prove. The results show that magnetic field 
                         configuration ensures efficient plasma confinement in the center 
                         of the vacuum chamber where the magnetic field has minimum value. 
                         This result is in agreement with the numerical simulation.",
  conference-location = "S{\~a}o Jos{\'e} dos Campos, SP",
      conference-year = "7-11 Sept.",
        urlaccessdate = "03 maio 2024"
}